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Standard Spares:
Optional Spares:
Plasma Enhanced Chemical Vapor Deposition Furnace Standard specification:
1. Heating System | ||
Max.temperature | 1200℃ (1 hour) | |
Working temperature | ≤1100℃ | |
Chamber size | Φ100*1650mm (Tube diamater is customizable) | |
Chamber material | High purity alumina fiber board | |
Thermocouple | K type | |
Temperatureaccuracy | ±1℃ | |
Temperature control | ● 50 programmable segments for precise control of heating rate, cooling rate and dwell time. ● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection. ● PLC automatic control system by PC controller inside. ● The temperature control system, sliding system (Time and Distance) could be controlled by program. | |
Heating length | 440mm | |
Constant heating length | 200mm | |
Heating element | Resistance wire | |
Power supply | Single phase, 220V, 50Hz | |
Rated power | 9kW | |
2. RF Plasma Source | ||
RF frequency | 13.56 MHz±0.005% | |
Output power | 500W | |
Max reflect power | 500W | |
RF output interface | 50 Ω, N-type, female | |
Power stability | ±0.1% | |
Harmonic component | ≤-50dbc | |
Supply voltage/Frequency | Single phase AC220V 50/60HZ | |
Whole efficiency | >=70% | |
Power factor | >=90% | |
Cooling method | Forced air | |
3. Three precision mass flowmeters control system | ||
External dimension | 600x600x650mm | |
Connector type | Swagelok SS joint | |
Standard range (N2) | 0~100sccm, 0~200sccm, or customizable | |
Accuracy | ±1.5% | |
Linear | ±0.5~1.5% | |
Repeatability | ±0.2% | |
Response time | Gas property: 1~4 Sec; | |
Pressure range | 0.1~0.5 MPa | |
Max.pressure | 3MPa | |
Interface | Φ6,1/4'' | |
Display | 4 digit display | |
Ambient temperature | 5~45 high purity gas | |
Pressure gauge | -0.1~0.15 MPa, 0.01 MPa/unit | |
Stop valve | Φ6 | |
Polish SS tube | Φ6 | |
Low vacuum system included |
Why Brother's Lab Plasma Enhanced Chemical Vapor Deposition Furnace?
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If you're interested in our Plasma Enhanced Chemical Vapor Deposition Furnace, contact us now to get a quote!